发明名称 |
Method and system for cleaning magnetic artifacts using a carbonyl reactive ion etch |
摘要 |
A method and system for providing a magnetic structure that includes at least one magnetic material is disclosed. The method and system include defining the magnetic structure. The magnetic structure also includes a top layer that is insensitive to an istroropic carbonyl reactive ion etch. The defining of the magnetic structure results in at least one artifact. The method and system further includes cleaning the at least one artifact using at least one isotropic carbonyl reactive ion etch.
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申请公布号 |
US7819979(B1) |
申请公布日期 |
2010.10.26 |
申请号 |
US20050046972 |
申请日期 |
2005.01.31 |
申请人 |
WESTERN DIGITAL (FREMONT), LLC |
发明人 |
CHEN BENJAMIN;LI YUN-FEI;HINER HUGH C.;ZHANG WEI;CHEN YINGJIAN |
分类号 |
B08B7/00;B08B7/04 |
主分类号 |
B08B7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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