| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a new inspecting photomask blank or intermediate thereof, evaluating stress of a phase shift film giving a change in surface topography causing a dimensional error in working a photomask blank, a method for determining dosage of high-energy radiation, and a method for manufacturing a photomask blank. <P>SOLUTION: The photomask blank or an intermediate thereof which is manufactured by depositing a phase shift film on a substrate for a photomask, and irradiating the phase shift film with high-energy radiation to effect substrate shape adjusting treatment is inspected by measuring a surface topography of the photomask blank after the substrate shape adjusting treatment, removing the phase shift film from the photomask blank or the intermediate thereof, measuring a surface topography of the treated substrate after removal of the phase shift film, and comparing the surface topographies, thereby evaluating a warpage change before and after removal of the phase shift film, due to a stress of the phase shift film having undergone substrate shape adjusting treatment. A stress to the substrate by the phase shift film after the substrate shape adjusting treatment is evaluated more accurately. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
