发明名称 EXAMINING METHOD AND EXAMINING APPARATUS
摘要 PROBLEM TO BE SOLVED: To solve such a problem in using a dark-field type examining apparatus, or the like, that it takes much time in adopting a method for determining examination conditions while measuring a signal, and a determination as to whether the set sensitivity conditions are appropriate, depends on operator's discretion. SOLUTION: An examining apparatus is provided which includes a stage for holding a sample; illuminating optics for irradiating a surface of the sample held on the stage, with illumination light; a dark-field optics for detecting scattered light generated by the illumination light with which the sample is irradiated; a photoelectric conversion section for converting the scattered light detected by the dark-field optics into an electrical signal; an AD conversion section for converting the electrical signal of the photoelectric conversion section into a digital signal; a determination section for determining a size of a foreign substance, on the basis of an intensity of the scattered light from the foreign substance on the sample surface; and a signal processing section for determining the examination conditions, by using the information of the light scattered from the sample surface. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010236968(A) 申请公布日期 2010.10.21
申请号 JP20090084001 申请日期 2009.03.31
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 MITOMO KENJI;OKA KENJI
分类号 G01N21/956 主分类号 G01N21/956
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