| 摘要 |
The present invention relates to a gas discharge source, for generating EUV radiation and/or soft X-radiation, comprising at least two electrode bodies (110,120), of which a first electrode body (110) comprises a rotatably mounted electrode disk (100). The source further comprises a rotary drive (130) for the electrode disk, a device for applying a liquid film of a target material (140) onto a radial outer surface of the electrode disk (100), and a laser that is focussed, within a discharge area (240), onto the radial outer surface of the electrode disk (100) to evaporate target material. The source is characterized by an intermediate space (160) is formed between the electrode bodies, which intermediate space has a reduced width of <5 mm outside the discharge area (240), which is smaller than the intermediate space in the discharge area. The source enables the generated radiation to be emitted in a simple manner through a larger solid angle, without being shadowed by the electrodes.
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