发明名称 SOLID-STATE IMAGING DEVICE, METHOD OF MANUFACTURING THE SAME AND ELECTRONIC DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a solid-state imaging device that suppresses flare or ghost, a method of manufacturing the same and an electronic device using the same. <P>SOLUTION: In the solid-state imaging device 1, incident light is collected onto a light receiving portion 2 formed on a substrate 9 by using a rectangular on-chip microlens 19. Also, a flat lens layer 20 is formed on an upper portion of the on-chip microlens 19. Generation of reflected diffraction light caused by a periodic structure is suppressed since the periodic structure such as the on-chip microlens 19 is not formed on an interface between a surface of the incident light of the solid imaging device 1 and air by allowing the flat lens layer 20 to be formed. This suppresses the ghost or flare. Also, sufficient light collecting characteristics is achieved and the sensitivity is improved by allowing the on-chip microlens 19 to be a rectangular shape (or graded refractive index) even if the flat lens layer 20 is used. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010239077(A) 申请公布日期 2010.10.21
申请号 JP20090088097 申请日期 2009.03.31
申请人 SONY CORP 发明人 WANO HIROMI;TODA ATSUSHI;OTSUKA YOICHI;YAMAMOTO ATSUSHI
分类号 H01L27/14;H04N5/335;H04N5/357;H04N5/359;H04N5/369;H04N5/372;H04N5/374 主分类号 H01L27/14
代理机构 代理人
主权项
地址