MANUFACTURING METHOD OF THIN FILM DEVICE AND THE THIN FILM DEVICE MANUFACTURED THEREOF

摘要

PURPOSE: A manufacturing method and a thin film device thereof are provided to accelerate the amorphizing of a sacrificial layer by remarkably reducing the divergence of heat. CONSTITUTION: A manufacturing method forms a sacrificial layer through a first oxide having a perovskite structure on a preparatory board. An electrode layer is formed into a second oxide having the perovskite structure on the sacrificial layer. A thin film laminated body(40) is formed on an electrode layer(30). A permanent substrate(50) is welded on the thin film laminated body. A laser is irradiated on the preparatory board and the sacrificial layer is decomposed. The preparatory board is separated from the electrode layer.