发明名称 METHOD OF MANUFACTURING GROUP III-V COMPOUND SEMICONDUCTOR ELEMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a group III-V compound semiconductor element containing GaAsSb as a group III-V compound semiconductor having good crystallinity. <P>SOLUTION: When a film of GaAs<SB>x</SB>Sb<SB>1-x</SB>(0.33&le;x&le;0.65) as a group III-V compound semiconductor is formed, the sum of supply amounts of molecules of both group-V arsenic (As) and antimony (Sb) is &ge;15 times as large as the supply amount of molecules of group-III gallium (Ga). <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010232298(A) 申请公布日期 2010.10.14
申请号 JP20090076280 申请日期 2009.03.26
申请人 SUMITOMO ELECTRIC IND LTD 发明人 MIURA KOHEI;NAGAI YOICHI;INADA HIROSHI;INOGUCHI YASUHIRO
分类号 H01L21/203;C23C14/06;H01L31/10 主分类号 H01L21/203
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