发明名称 |
METHOD OF MANUFACTURING GROUP III-V COMPOUND SEMICONDUCTOR ELEMENT |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a group III-V compound semiconductor element containing GaAsSb as a group III-V compound semiconductor having good crystallinity. <P>SOLUTION: When a film of GaAs<SB>x</SB>Sb<SB>1-x</SB>(0.33≤x≤0.65) as a group III-V compound semiconductor is formed, the sum of supply amounts of molecules of both group-V arsenic (As) and antimony (Sb) is ≥15 times as large as the supply amount of molecules of group-III gallium (Ga). <P>COPYRIGHT: (C)2011,JPO&INPIT |
申请公布号 |
JP2010232298(A) |
申请公布日期 |
2010.10.14 |
申请号 |
JP20090076280 |
申请日期 |
2009.03.26 |
申请人 |
SUMITOMO ELECTRIC IND LTD |
发明人 |
MIURA KOHEI;NAGAI YOICHI;INADA HIROSHI;INOGUCHI YASUHIRO |
分类号 |
H01L21/203;C23C14/06;H01L31/10 |
主分类号 |
H01L21/203 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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