发明名称 SEMICONDUCTOR SUBSTRATE, METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, METHOD FOR EVALUATING SEMICONDUCTOR SUBSTRATE, AND ELECTRONIC DEVICE
摘要 <p>Provided is a high-performance compound semiconductor epitaxial substrate having improved linearity of the voltage-current characteristics. A method for manufacturing such substrate and a method for evaluating such substrate are also provided. The semiconductor substrate is provided with: a compound semiconductor which generates a two-dimensional carrier gas; a carrier supplying semiconductor which supplies the compound semiconductor with a carrier; and a mobility reducing semiconductor which is disposed between the compound semiconductor and the carrier supplying semiconductor, and has a mobility reducing factor of reducing the carrier mobility to be smaller than that of the compound semiconductor.</p>
申请公布号 WO2010116699(A1) 申请公布日期 2010.10.14
申请号 WO2010JP02447 申请日期 2010.04.02
申请人 SUMITOMO CHEMICAL COMPANY, LIMITED;NAKANO, TSUYOSHI 发明人 NAKANO, TSUYOSHI
分类号 H01L21/338;H01L29/778;H01L29/812 主分类号 H01L21/338
代理机构 代理人
主权项
地址