发明名称 |
SEMICONDUCTOR SUBSTRATE, METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, METHOD FOR EVALUATING SEMICONDUCTOR SUBSTRATE, AND ELECTRONIC DEVICE |
摘要 |
<p>Provided is a high-performance compound semiconductor epitaxial substrate having improved linearity of the voltage-current characteristics. A method for manufacturing such substrate and a method for evaluating such substrate are also provided. The semiconductor substrate is provided with: a compound semiconductor which generates a two-dimensional carrier gas; a carrier supplying semiconductor which supplies the compound semiconductor with a carrier; and a mobility reducing semiconductor which is disposed between the compound semiconductor and the carrier supplying semiconductor, and has a mobility reducing factor of reducing the carrier mobility to be smaller than that of the compound semiconductor.</p> |
申请公布号 |
WO2010116699(A1) |
申请公布日期 |
2010.10.14 |
申请号 |
WO2010JP02447 |
申请日期 |
2010.04.02 |
申请人 |
SUMITOMO CHEMICAL COMPANY, LIMITED;NAKANO, TSUYOSHI |
发明人 |
NAKANO, TSUYOSHI |
分类号 |
H01L21/338;H01L29/778;H01L29/812 |
主分类号 |
H01L21/338 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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