发明名称 METHOD FOR DIRECT-LASER PATTERNING OF THIN FILM
摘要 <p>PURPOSE: A method for directing patterning a thin film with laser is provided to form a wanted thin film pattern on a substrate and increase a patterning speed by separating the thin film with a single pulse. CONSTITUTION: A light transmitting substrate is provided. A laser absorbing metal layer is formed on one side of the substrate. An ITO layer is formed on the laser absorbing metal layer. A pulse beam laser beam is irradiated on the surface without the laser absorbing metal layer and the ITO layer by passing through a spatial light modulator. A pattern corresponding to the pattern of the spatial light modulator is formed on the laser absorbing metal layer and the ITO layer by separating the laser absorbing metal layer and the ITO layer from the substrate.</p>
申请公布号 KR20100110447(A) 申请公布日期 2010.10.13
申请号 KR20090028776 申请日期 2009.04.03
申请人 INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY 发明人 LEE, MYEONG KYU;SHIN, HYUN KWON;SIM, BO YEON
分类号 H01L21/306;G03F7/20;H01L21/027;H01L21/268 主分类号 H01L21/306
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