发明名称 METHODS OF PATTERNING SUBSTRATES USING MICROCONTACT PRINTED POLYMER RESISTS AND ARTICLES PREPARED THEREFROM
摘要 <p>The present invention is directed to methods for patterning substrates using contact printing to form patterns comprising a polymer, using the patterns formed therefrom as resists, and process products formed by the process.</p>
申请公布号 WO2010115027(A1) 申请公布日期 2010.10.07
申请号 WO2010US29665 申请日期 2010.04.01
申请人 NANO TERRA INC.;MERCK PATENT GMBH;AGARWAL, SANDIP;MAYERS, BRIAN, T.;MCLELLAN, JOSEPH, M.;KUGLER, RALF;KURSAWE, MONIKA 发明人 AGARWAL, SANDIP;MAYERS, BRIAN, T.;MCLELLAN, JOSEPH, M.;KUGLER, RALF;KURSAWE, MONIKA
分类号 G03F1/00 主分类号 G03F1/00
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