| 发明名称 |
POSITIVE PHOTOSENSITIVE COMPOSITION |
| 摘要 |
A positive photosensitive composition comprises a compound capable of generating a specified sulfonic acid upon irradiation with one of an actinic ray and radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer.
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| 申请公布号 |
US2010255419(A1) |
申请公布日期 |
2010.10.07 |
| 申请号 |
US20100816738 |
申请日期 |
2010.06.16 |
| 申请人 |
FUJIFILM CORPORATION |
发明人 |
KODAMA KUNIHIKO;AOAI TOSHIAKI |
| 分类号 |
G03F7/004;C07C309/00;C07C309/06;C07C381/12;G03F7/039 |
主分类号 |
G03F7/004 |
| 代理机构 |
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代理人 |
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| 主权项 |
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