| 摘要 |
A vacuum processing system includes a transfer chamber configured to form a vacuum atmosphere through which a target object is transferred. A transfer mechanism is disposed in the transfer chamber and configured to transfer the target object. A process chamber is connected to the transfer chamber through a first gate valve and configured to perform a process on the target object within a vacuum atmosphere. A first exhaust port is formed in a bottom of the transfer chamber at the foot of the first gate valve. A first gas exhaust section is connected to the first exhaust port and configured to exhaust gas inside the transfer chamber.
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