发明名称 EPITAXIAL WAFER FOR LIGHT EMITTING DIODE, AND METHOD OF MANUFACTURING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide an epitaxial wafer for a light emitting diode capable of easily enhancing light extraction efficiency, and to provide a method of manufacturing the epitaxial wafer for the light emitting diode. <P>SOLUTION: The method of manufacturing the epitaxial wafer for an AlGaInP based light emitting diode, using vapor deposition method, at least performs forming of a laminate by laminating: a light emitting portion 6 which has an n-type clad layer 2, an active layer 3 and a p-type clad layer 4 which are made of AlGaInP based materials; and a p-type GaP current dispersion layer 5. When the GaP current dispersion layer 5 is formed, concavities and convexities are formed on the surface 5c of the GaP current dispersion layer 5 by increasing a growth speed on a surface side part of the GaP current dispersion layer 5. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010225612(A) 申请公布日期 2010.10.07
申请号 JP20090067899 申请日期 2009.03.19
申请人 HITACHI CABLE LTD 发明人 FURUYA TAKASHI
分类号 H01L33/22;C23C16/30;H01L21/205;H01L33/30 主分类号 H01L33/22
代理机构 代理人
主权项
地址