摘要 |
Provided are a source supplying unit and a method for supplying a source. The source supplying unit includes a pot configured to store a source material, an injector communicating with the pot to inject the source material evaporated from the pot, a high frequency coil part surrounding an outside of the pot, and a resistance-type heating part disposed at an outside of the injector. Since a high frequency induction heating method and a resistance-type heating method are combined to evaporate a source material to be supplied, a large amount of source material can be used, and the thickness and quality of a thin film can be easily controlled. |
申请人 |
SNU PRECISION CO., LTD;BAE, KYUNG BIN;RHO, JUN SEO;CHO, WHANG SIN;KWON, JIN HAON;LEE, JONG HA;KIM, YOU HYUN;YOON, HYUNG SEOK |
发明人 |
BAE, KYUNG BIN;RHO, JUN SEO;CHO, WHANG SIN;KWON, JIN HAON;LEE, JONG HA;KIM, YOU HYUN;YOON, HYUNG SEOK |