ASYMMETRICAL RF DRIVE FOR ELECTRODE OF PLASMA CHAMBER,申请号EP20080863883-传众专利搜索

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发明名称	ASYMMETRICAL RF DRIVE FOR ELECTRODE OF PLASMA CHAMBER
摘要
申请公布号	EP2232958(A2)	申请公布日期	2010.09.29
申请号	EP20080863883	申请日期	2008.12.24
申请人	APPLIED MATERIALS, INC.	发明人	KUDELA, JOZEF;SORENSEN, CARL, A.;CHOI, SOO YOUNG;WHITE, JOHN, M.
分类号	H05H1/34;H01L21/3065	主分类号	H05H1/34
代理机构		代理人
主权项
地址

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