| 摘要 |
PURPOSE: A substrate processing device and a gas recycling method thereof are provided to reduce costs by reducing the use of refrigerant which is used for the recycling of carbon dioxide. CONSTITUTION: A high pressure processing device cleans, rinses, or dries a substrate by using supercritical carbon dioxide and an additive. A carbon dioxide supply part supplies liquid carbon dioxide. The carbon dioxide and the addictive are discharged through an exhaust line(L1). The carbon dioxide and the addictive are branched through the exhaust line to a first and a second branch line(L2,L3). |
