SPIN COATER APPARATUS AND METHOD FOR COATING PHOTO REGISTER USING THE SAME

摘要

PURPOSE: A spin coater apparatus and a method for coating a photoresist using the same are provided to prevent bubbles from being generated on a wafer when a highly viscous photoresist is coated and to evenly coat the highly viscous photoresist. CONSTITUTION: A method for coating a photoresist using a spin coater which coats the photoresist while rotating a wafer comprises the following steps: performing a first coating process of coating a wafer(110) with the photoresist using a nozzle(130) for spraying the photoresist from the edge of the wafer to the center of the wafer; firstly baking the firstly coated photoresist; secondarily coating the photoresist on the wafer by moving the nozzle; and secondarily baking the secondarily coated photoresist.