发明名称 |
Substrate Support Structure, Clamp Preparation Unit, and Lithography System |
摘要 |
A substrate support structure for clamping a substrate by means of a capillary force created by a liquid clamping layer having a lower pressure than its surroundings. The substrate support structure comprises a surface provided with a plurality of substrate supporting elements for holding the substrate, and the surface further comprises portions with different capillary potential for inducing, during clamping, a predetermined capillary flow within the liquid clamping layer. |
申请公布号 |
US2010236476(A1) |
申请公布日期 |
2010.09.23 |
申请号 |
US20100709645 |
申请日期 |
2010.02.22 |
申请人 |
MAPPER LITHOGRAPHY IP B.V. |
发明人 |
DE JONG HENDRIK JAN |
分类号 |
B05C11/00;B23Q3/00;B23Q7/00;B32B5/14;H01L21/677 |
主分类号 |
B05C11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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