发明名称 Substrate Support Structure, Clamp Preparation Unit, and Lithography System
摘要 A substrate support structure for clamping a substrate by means of a capillary force created by a liquid clamping layer having a lower pressure than its surroundings. The substrate support structure comprises a surface provided with a plurality of substrate supporting elements for holding the substrate, and the surface further comprises portions with different capillary potential for inducing, during clamping, a predetermined capillary flow within the liquid clamping layer.
申请公布号 US2010236476(A1) 申请公布日期 2010.09.23
申请号 US20100709645 申请日期 2010.02.22
申请人 MAPPER LITHOGRAPHY IP B.V. 发明人 DE JONG HENDRIK JAN
分类号 B05C11/00;B23Q3/00;B23Q7/00;B32B5/14;H01L21/677 主分类号 B05C11/00
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