| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To reduce the effect of thickness variation in a substrate surface of a thin film, and to improve measurement accuracy. <P>SOLUTION: An apparatus for testing the thin film includes a light source for irradiating a glass substrate W to be tested on which the thin film is formed with light of a single wavelength from the glass substrate side, a light-receiving element the light receiving axis of which crosses at a predetermined angle of inclination with respect to an optical axis of the irradiation light emitted from the light source and which receives transmitted and diffused light passing through the substrate W to be tested, and a computer 7 for obtaining a haze rate of the thin film according to the intensity of the light received by the light-receiving element. The computer 7 has a haze rate characteristic such that the haze rate and the intensity of the transmitted and diffused light are associated with each other and obtains the haze rate from the haze rate characteristics and the intensity of the light received by the light-receiving element. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
