| 发明名称 |
RADIATION SOURCE, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD |
| 摘要 |
A plasma radiation source includes a vessel configured to catch a source material transmitted along a trajectory, and a decelerator configured to reduce a speed of the source material in a section of the trajectory downstream of a plasma initiation site.
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| 申请公布号 |
US2010231130(A1) |
申请公布日期 |
2010.09.16 |
| 申请号 |
US20100712545 |
申请日期 |
2010.02.25 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
LABETSKI DZMITRY;LOOPSTRA ERIK ROELOF;SWINKELS GERARDUS HUBERTUS PETRUS MARIA;VAN ZUTPHEN TOM |
| 分类号 |
H05H1/00;H01J61/28 |
主分类号 |
H05H1/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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