| 发明名称 |
Mold, pattern forming method, and pattern forming apparatus |
| 摘要 |
A mold applicable to imprinting includes a first surface having an area of a pattern to be transferred, a second surface located opposite from the first surface, a first mark for alignment provided at the first surface, and a second mark for alignment provided at a position at which the second mark is spaced from the first surface. |
| 申请公布号 |
US7794222(B2) |
申请公布日期 |
2010.09.14 |
| 申请号 |
US20060448009 |
申请日期 |
2006.06.07 |
| 申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
SUEHIRA NOBUHITO;SEKI JUNICHI;MAJIMA MASAO;TERASAKI ATSUNORI;INA HIDEKI |
| 分类号 |
B28B17/00;B29C33/30;B29C33/38;B29C59/00;B29C59/02;B82B1/00;B82Y10/00;B82Y30/00;B82Y40/00;G01B11/00;G03F7/20;H01L21/027 |
主分类号 |
B28B17/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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