PRODUCTION METHOD TO USEING OZONE FUNCTIONAL WATER PRODUCTION SYSTEM AND OZONE FUNCTIONAL WATER PRODUCTION SYSTEM EQUAL CONCENTRATION FOR SILICONWAFER

摘要

PURPOSE: A system and a method for manufacturing ozone functional water, which is used for washing silicon wafers, are provided to effectively control the ozone functional water to have a uniform concentration and to shorten a concentration control time. CONSTITUTION: A system for manufacturing ozone functional water having a uniform concentration comprises: an ultrapure water supply device(10); an ozone creation device(20); an injector(30) for mixing the ultrapure water and ozone gas; a liquid gas contact device(40) which manufactures the ozone functional water by increasing the contact between the ozone gas and microbubble-shaped ultrapure water particles; a functional water reservoir(50) including a return piping line; an ozone decomposition device(60) for decomposing residual ozone gas and the ozone of discharged functional water; a functional water concentration measuring device(70); a PID mode functional water concentration controller(80); and a power supply device(90) which controls the concentration of created ozone gas.