发明名称 |
FINE THROUGH HOLE SUBSTRATE, AND METHOD OF MANUFACTURING THE SAME |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a fine through hole substrate that suppresses peeling of a metal film of ≥5 μm in thickness from the fine through hole substrate, and to provide a method of manufacturing the same. Ž<P>SOLUTION: The fine through hole substrate includes: a substrate 2 in which a through hole 1 is formed; the metal layer 3 provided on one surface side of the substrate 2 and having a thickness of ≥5 μm; and a lock member 4 formed in the through hole 1 and made of a metal material, wherein the lock member 4 and metal layer 3 are coupled together in one body, the lock member 4 is locked in the through hole 1, and the metal layer 3 coupled to the lock member 4 in the one body is joined to the one surface side of the substrate 2. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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申请公布号 |
JP2010199188(A) |
申请公布日期 |
2010.09.09 |
申请号 |
JP20090040555 |
申请日期 |
2009.02.24 |
申请人 |
PANASONIC ELECTRIC WORKS CO LTD |
发明人 |
IWAMOTO NARIMASA;YOSHIHARA TAKAAKI;BABA TORU;YOKOYAMA KOJI |
分类号 |
H05K1/11;H01H50/56;H05K3/38;H05K3/40 |
主分类号 |
H05K1/11 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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