发明名称 NEW DIBLOCK COPOLYMER AND HIGH MOBILITY/PHOTOCONDUCTIVITY ANISOTROPIC NANOWIRE FORMED BY SELF-ASSEMBLING OF THE DIBLOCK COPOLYMER
摘要 <p><P>PROBLEM TO BE SOLVED: To form a highly ordered nano-structural material having electronic or photovoltaic properties by self-assembling of a newly prepared diblock copolymer. <P>SOLUTION: The high mobility/photoconductivity anisotropic nanowire is formed by following steps, that is: (i) a step of dissolving the diblock copolymer expressed by formula (1); (ii) a step of depositing the uniform copolymer solution on a substrate; (iii) a step of forming a nanowire directly on the substrate by vaporizing the solvent. (In the formula, R represents a phenyl group, each of (p) and (q) is an integer selected from 1-1,000, D represents porphyrin-containing group of a hydrophilic donor and A is a fullerene-containing group of a hydrophobic acceptor). <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2010195918(A) 申请公布日期 2010.09.09
申请号 JP20090041732 申请日期 2009.02.25
申请人 NATIONAL INSTITUTE FOR MATERIALS SCIENCE 发明人 CHARVET RICHARD;HILL JONATHAN;ARIGA KATSUHIKO
分类号 C08G61/08;D01F6/00;D01F6/96;H01L51/42 主分类号 C08G61/08
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