发明名称 SUBSTRATE PROCESSING SYSTEM
摘要 PURPOSE: A substrate processing system is provided to increase productivity by reducing a time of heating and cooling down the substrate. CONSTITUTION: A multi-layer substrate pre-heat treatment unit(170) preheats a plurality of substrates which are loaded successively. A work processing unit process the substrate transferred from the pre-heat treatment unit. The work processing unit comprises a first processing chamber(110), a second processing chamber(120), and a transfer room(130). The multi-layer substrate cooling process unit(180) cools down the substrate transferred from the work processing unit.
申请公布号 KR20100098086(A) 申请公布日期 2010.09.06
申请号 KR20090017088 申请日期 2009.02.27
申请人 NEW POWER PLASMA CO., LTD. 发明人 CHOI, DAI KYU
分类号 H01L21/02;H01L21/324 主分类号 H01L21/02
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