发明名称 SUBSTRATE PROCESSING SYSTEM
摘要 PURPOSE: A substrate processing system is provided to improve the amount of processed wafers by controlling the transfer of a wafer at each transfer line. CONSTITUTION: A transfer device(50) transfers a loaded substrate(W) in one direction. The transfer device includes a sheet(101) for loading the substrate and a plurality of transfer rolls(100) which is rotatably installed to support and move the sheet. A processing device processes the substrate loaded on the transfer device.
申请公布号 KR20100097037(A) 申请公布日期 2010.09.02
申请号 KR20100016027 申请日期 2010.02.23
申请人 TOKYO ELECTRON LIMITED 发明人 HAYASHIDA YASUSHI
分类号 H01L21/677;B65G15/30;B65G49/07;H01L21/02 主分类号 H01L21/677
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