| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition having high transparency for radiation and excellent basic physical properties such as sensitivity and resolution as a resist. <P>SOLUTION: The positive resist composition contains: a resin component comprising a copolymer which is alkali-insoluble or hardly soluble with an alkali and is changed into alkali-soluble by an action of an acid, the copolymer comprising only two components of a repeating unit having an acid dissociable group expressed by formula (1) and a repeating unit having a lactone structure expressed by formula (2); and an acid generating component generating an acid by radiation. In formula (1) and formula (2), R<SP>1</SP>may be identical or different from each other, and represents a hydrogen atom, a 1C-10C linear or branched alkyl group or a 1C-4C fluoroalkyl group; and in formula (1), R<SP>2</SP>represents a 1C-10C linear or branched alkyl group; n represents an integer 1 to 9; and m represents an integer of 0 to 2. <P>COPYRIGHT: (C)2010,JPO&INPIT |
