| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an alkoxymethyl compound in which when used as an additive of a photosensitive resin composition, the remained film ratio at the time of curing when making a cyclic resin is high, and which has a lithography performance of a high sensitivity positive type. <P>SOLUTION: The alkoxymethyl compound is expressed by formula (1). In the formula (1), Z<SB>1</SB>is -CO-R<SB>3</SB>or -SO<SB>2</SB>-R<SB>4</SB>(R<SB>3</SB>and R<SB>4</SB>are a 1-9C organic group), R is a methyl group or an ethyl group, k is an integer of 1-4, Z<SB>2</SB>is C<SB>n</SB>H<SB>2n</SB>OR<SB>1</SB>or R<SB>2</SB>when k=1, R<SB>1</SB>is a methyl group, an ethyl group, an n-propyl group, or an isopropyl group, R<SB>2</SB>is a hydrogen atom or a 1-4C hydrocarbon group, n is an integer of 1-3, and R<SB>2</SB>is a single bond or an organic group of 2-4 valences when k=2-4. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
