摘要 |
<P>PROBLEM TO BE SOLVED: To improve the throughput of substrate processing by efficiently conveying substrates. Ž<P>SOLUTION: A coating development processing unit 1 includes a track 42 formed annular in plane view, a plurality of substrate holding parts 41 configured to hold substrates W and to move on the track 42, a plurality of processing devices arranged along the track 42 and configured to perform predetermined processing on the substrates W, a control device 14 configured to control conveyance of the substrates W between the substrate holding parts 41 and the processing devices, and a substrate conveyance mechanism configured to deliver and receive the substrates between the substrate holding parts 41 and the processing devices. The plurality of substrate holding parts 41 are arranged more in the number than the plurality of processing devices. The control part 14 includes a recipe storage part 170 which stores a processing recipie for the substrates W, a substrate holding part control part 171 which moves the substrate holding parts 41 to predetermined processing devices according to the processing recipie, and a substrate conveyance mechanism control part 172 which controls the substrate conveyance mechanism so as to convey the substrates between the substrate holding parts 41 and the predetermined processing devices. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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