发明名称 LASER LIGHT SOURCE DEVICE, EXPOSURE APPARATUS USING THIS LASER LIGHT SOURCE DEVICE, AND MASK EXAMINING DEVICE
摘要 A laser light source device 1, comprising M number of laser light sources, of which frequency is shifted from a fundamental frequency by (m -1) · a · ”É, a first laser light source section 2 and a first fiber amplifier section 4 for amplifying these laser lights, a first optical multiplexer 6 for approximately coaxially superimposing the laser lights emitted from the first fiber amplifier section 4 and emitting the laser lights, a first wavelength conversion device 9 for multiplying the frequency of the laser lights emitted from the first optical multiplexer 6 by A, M number of laser light sources, of which frequency is shifted from the fundamental frequency by (m - 1) · b · ”É, a second laser light source section 3 and a second fiber amplifier section 5 for amplifying these laser lights, a second optical multiplexer 7 for approximately coaxially superimposing the laser lights emitted from the second fiber amplifier section 5 and emitting the laser lights, a second wavelength conversion device 10 for multiplying the frequency of the laser lights emitted from the second optical multiplexer 7 by B, and a third wavelength conversion device 11 for simultaneously receiving the laser lights emitted from the first and second wavelength conversion devices 9 and 10 and converting the laser lights into laser lights, of which frequency is (A + B) times the fundamental frequency, the laser light source device 1 being characterized in that the expression A · a + B · b = 0 is satisfied.
申请公布号 EP1724633(A4) 申请公布日期 2010.08.25
申请号 EP20050720652 申请日期 2005.03.07
申请人 NIKON CORPORATION 发明人 KAWAI, HITOSHI
分类号 G02F1/37;G03F1/00;G03F7/20;H01L21/027;H01S3/00;H01S3/23;H04J14/00;H04J14/08 主分类号 G02F1/37
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