发明名称 |
TEXTURING AND CLEANING AGENT FOR THE SURFACE TREATMENT OF WAFERS AND USE THEREOF |
摘要 |
<p>A liquid agent for the surface treatment of monocrystalline wafers, which contains an alkaline etching agent and also at least one low-volatile organic compound. Systems of this type can be used both for the cleaning, damage etch and texturing of wafer surfaces in a single etching step and exclusively for the texturing of silicon wafers with different surface quality, whether it now be wire-sawn wafers with high surface damage or chemically polished surfaces with minimum damage density.</p> |
申请公布号 |
KR20100093098(A) |
申请公布日期 |
2010.08.24 |
申请号 |
KR20107014188 |
申请日期 |
2008.12.08 |
申请人 |
FRAUNHOFER-GESELLSCHAFT ZUR FORDERUNG DER ANGEWANDTEN FORSCHUNG E. V. |
发明人 |
MAYER KUNO;SCHUMANN MARK;KRAY DANIEL;ORELLANA PERES TERESA;RENTSCH JOCHEN;ZIMMER MARTIN;KIRCHGASSNER ELIAS;ZIMMER EVA;BIRO DANIEL;ROSTAS ARPAD MIHAI |
分类号 |
C11D11/00;C11D7/06;C11D7/26 |
主分类号 |
C11D11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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