发明名称 TEXTURING AND CLEANING AGENT FOR THE SURFACE TREATMENT OF WAFERS AND USE THEREOF
摘要 <p>A liquid agent for the surface treatment of monocrystalline wafers, which contains an alkaline etching agent and also at least one low-volatile organic compound. Systems of this type can be used both for the cleaning, damage etch and texturing of wafer surfaces in a single etching step and exclusively for the texturing of silicon wafers with different surface quality, whether it now be wire-sawn wafers with high surface damage or chemically polished surfaces with minimum damage density.</p>
申请公布号 KR20100093098(A) 申请公布日期 2010.08.24
申请号 KR20107014188 申请日期 2008.12.08
申请人 FRAUNHOFER-GESELLSCHAFT ZUR FORDERUNG DER ANGEWANDTEN FORSCHUNG E. V. 发明人 MAYER KUNO;SCHUMANN MARK;KRAY DANIEL;ORELLANA PERES TERESA;RENTSCH JOCHEN;ZIMMER MARTIN;KIRCHGASSNER ELIAS;ZIMMER EVA;BIRO DANIEL;ROSTAS ARPAD MIHAI
分类号 C11D11/00;C11D7/06;C11D7/26 主分类号 C11D11/00
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