LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

摘要

PURPOSE: A lithography apparatus and a method for manufacturing a device are provided to reduce a thermal load applied to the upper surface of a liquid limitation system by preventing the evaporation of an immersion solution from the surface of final element of a projection system. CONSTITUTION: A projection system(PL) projects patterned radiation beam toward the target region of a substrate. A barrier unit(10) surrounds a space between the projection system and the substrate to form a storing part. The external surface of the barrier unit faces toward a lyophobic external layer. An inner edge is partially formed in the lyophobic external layer in order to for the storing part.