发明名称 RADIATION-SENSITIVE RESIN COMPOSITION
摘要 A radiation-sensitive resin composition includes (A) an acid labile group-containing resin which becomes alkali-soluble by an action of an acid, (B) a radiation-sensitive acid generator, and (C) a solvent. The resin (A) includes repeating units shown by formulas (1) and (2), wherein R1 and R2 represent a hydrogen atom or a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms, R3 represents a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms, X represents a hydrogen atom, a hydroxyl group, or an acyl group, m represents an integer from 1 to 18, and n represents an integer from 4 to 8.
申请公布号 US2010203447(A1) 申请公布日期 2010.08.12
申请号 US20100701592 申请日期 2010.02.07
申请人 JSR CORPORATION 发明人 OTSUKA NOBORU;KAWAKAMI TAKANORI;NISHIMURA YUKIO;SUGIURA MAKOTO
分类号 G03F7/20;G03F7/004 主分类号 G03F7/20
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