发明名称 SEMICONDUCTOR DEVICE
摘要 There is provided a semiconductor device including: a field effect transistor that is provided with a gate region, a drain region and a source region and that is formed on a substrate; a circuit region that is formed on the substrate so as to be electrically isolated from the field effect transistor; a first guard ring that is formed in a ring shape encircling the field effect transistor and that includes an internal resistance; and a second guard ring that is formed in a ring shape encircling the circuit region, that forms a capacitance between the second guard ring and the gate region by capacitive coupling with the gate region, and that includes an internal resistance.
申请公布号 US2010200921(A1) 申请公布日期 2010.08.12
申请号 US20100693562 申请日期 2010.01.26
申请人 FUCHIGAMI CHIKASHI 发明人 FUCHIGAMI CHIKASHI
分类号 H01L27/092 主分类号 H01L27/092
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