| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a pattern layout creation method for dividing a pattern layout diagram into two parts so as to form patterns with high precision. <P>SOLUTION: The pattern layout creation method includes: a graph generation process (S2) for generating a graph in which patterns generated bassed on a pattern layout diagram are each regarded as nodes and nodes of patterns adjacent to each other at a first distance are connected with each other by an edge; a classification process (S3) for classifying each of the patterns into two types; and a classification result correction process (S5-S14) for correcting a classification result by grouping the patterns in each node cluster connected by the edge, and by inverting each of types of a pattern belonging to a same group as that of one pattern, out of a pair of patterns that are classified into a same type and that belong to respectively different groups adjacent to each other at a second distance. The pattern layout diagram is divided based on the classification result corrected in the classification result correction process. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
