发明名称 PROXIMITY EXPOSURE APPARATUS, CHUCK HEIGHT ADJUSTMENT METHOD OF PROXIMITY EXPOSURE APPARATUS, AND METHOD FOR PRODUCING DISPLAY PANEL SUBSTRATE
摘要 <P>PROBLEM TO BE SOLVED: To improve flatness of a chuck by easily adjusting a chuck height even when the chuck is large. <P>SOLUTION: A proximity exposure apparatus has a motor 32 and a lifting mechanism 33 which is moved up and down by the motor 32. In the apparatus, a plurality of chuck supporting mechanisms 31 which support a backside of the chuck 10 are provided on a chuck supporting stand 9, thereby supporting the backside of the chuck 10 with the plurality of chuck supporting mechanisms 31 at a plurality of places. The lifting mechanism 33 of the each chuck supporting mechanism 31 is moved up and down by driving the motor 32 of the each chuck supporting mechanism 31, so that the height to support the backside of the chuck 10 is adjusted, thereby adjusting the height of the chuck 10. The height of the chuck 10 is easily adjusted by the chuck supporting mechanism 31 having the motor 32 and the lifting mechanism 33 even when the chuck 10 is large, thereby improving the flatness of the chuck 10. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010175661(A) 申请公布日期 2010.08.12
申请号 JP20090016111 申请日期 2009.01.28
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 OTSUKA TOMOO
分类号 G03F7/20;G02F1/13;H01L21/027 主分类号 G03F7/20
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