发明名称 |
EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS AND CLEANING METHOD |
摘要 |
An extreme ultraviolet light source apparatus that can eliminate debris adhering to a component such as optical elements provided within a chamber. The extreme ultraviolet light source apparatus includes: a chamber in which extreme ultraviolet light is generated; a target material supply unit for supplying a target material into the chamber; a driver laser unit for irradiating the target material with a driver pulse laser beam to generate plasma; a cleaning laser unit for emitting a cleaning pulse laser beam; and a control unit for controlling an irradiation position of the cleaning pulse laser beam emitted from the cleaning laser unit so as to irradiate a component provided within the chamber with the cleaning pulse laser beam to remove debris adhering to a surface of the component.
|
申请公布号 |
US2010192973(A1) |
申请公布日期 |
2010.08.05 |
申请号 |
US20100688139 |
申请日期 |
2010.01.15 |
申请人 |
UENO YOSHIFUMI;WAKABAYASHI OSAMU |
发明人 |
UENO YOSHIFUMI;WAKABAYASHI OSAMU |
分类号 |
B08B7/00;B05D3/06;H05H1/00 |
主分类号 |
B08B7/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|