| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a translucent thin film which can be used as a surface characteristic reforming film, a passivation film, a gas barrier film, etc., and never causes optical variation, and a film deposition method therefor for a base body used for a flat panel display, an optical element, etc. <P>SOLUTION: A silicon dioxide film contains argon by 1 to 10 for 100 of silicon in terms of the ratio of the number of atoms. The translucent thin film is obtained by depositing the silicon dioxide film by an arc plasma enhanced vapor-deposition method using a pressure gradient type plasma gun. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
