发明名称 Semiconductor device including multi-layered interconnection and method of manufacturing the device
摘要 The semiconductor device includes a semiconductor substrate, and a multi-layer wiring portion including insulating layers and wiring layers alternately stacked one on another on a main surface of the semiconductor substrate. All of the wiring layers are made of a same basis metal, at least one of the wiring layers contains an additive element, and a concentration of the additive element is lower on an upper layer side than that on a lower layer side.
申请公布号 US7768127(B2) 申请公布日期 2010.08.03
申请号 US20050250530 申请日期 2005.10.17
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 YAMADA MASAKI;SHIBATA HIDEKI
分类号 H01L21/768;H01L23/48;H01L21/3205;H01L21/822;H01L23/52;H01L23/532;H01L27/04 主分类号 H01L21/768
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