METHOD FOR MOLDING SILICA GLASS CONTAINING TIO2 AND OPTICAL MEMBER FOR EUV LITHOGRAPHY MOLDED THEREBY

摘要

PROBLEM TO BE SOLVED: To provide a method for molding glass for EUV lithography which allows a large mass vitreous body to be produced by fusing a plurality of vitreous bodies.

SOLUTION: The method for molding glass for EUV lithography includes heating and fusing two or more vitreous bodies to any temperature between a slow cooling point and the softening point in an atmosphere of 10 Torr or less and then molding them at a temperature between the softening point and the softening point+250°C in an atmosphere exceeding 100 Torr.

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