发明名称 A METHOD FOR DEPOSITION OF AT LEAST ONE ELECTRICALLY CONDUCTING FILM ON A SUBSTRATE
摘要 <p>The invention relates to a method for deposition of at least one electrically conducting film (20) on a substrate (30), comprising the steps: selecting a layer (10) of a film material, wherein the layer (10) comprises a mask (40) on a front side (11) and wherein the layer (10) and the mask (40) are one piece, - positioning the front side (11) of the layer (10) upon the substrate (30), applying at least one laser pulse (120) onto a back side (12) of the layer (10), so as to melt and to vaporize at least parts of the layer (10) such that melt droplets (110) are propelled toward and deposited upon said substrate (30), forming the film (20), wherein at least one slot (45) of the mask (40) limits the distribution of said melt droplets (110).</p>
申请公布号 WO2010082151(A1) 申请公布日期 2010.07.22
申请号 WO2010IB50083 申请日期 2010.01.11
申请人 PHILIPS INTELLECTUAL PROPERTY & STANDARDS GMBH;KONINKLIJKE PHILIPS ELECTRONICS N. V.;FRAUNHOFER GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V.;BERTRAM, DIETRICH;KRIJNE, JOHANNES;SCHWAB, HOLGER;YOUNG, EDWARD, W., A.;VAN BUUL, JEROEN, H., A., M.;GASSER, ANDRES;WISSENBACH, KONRAD;VEDDER, CHRISTIAN;PIRCH, NORBERT;STOLLENWERK, JOCHEN, H. 发明人 BERTRAM, DIETRICH;KRIJNE, JOHANNES;SCHWAB, HOLGER;YOUNG, EDWARD, W., A.;GASSER, ANDRES;WISSENBACH, KONRAD;VEDDER, CHRISTIAN;PIRCH, NORBERT;STOLLENWERK, JOCHEN, H.
分类号 H01L51/00;C23C14/28 主分类号 H01L51/00
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