发明名称 A TEST METHOD ON THE SUPPORT SUBSTRATE OF A SUBSTRATE OF THE SEMICONDUCTOR ON INSULATOR TYPE
摘要 <p>The invention relates to a test method comprising an electrical connection contact on the support (2) of a substrate of the "semiconductor on insulator" type (1). This method is remarkable in that it comprises the steps of : a) taking a substrate (1) of the "semiconductor on insulator" type comprising a support substrate (2) entirely covered with an insulator layer (3) and an active layer (4), a portion (31) of said insulator layer (3) being buried between the active layer and the front face (21) of the support substrate (2), b) removing a portion of said insulator layer (3) which extends at the periphery of the front face (21) of the support substrate (2) and/or which extends on its rear face (22), so as to delimit at least one insulator-free accessible area (210) of the support substrate (2), while retaining at least one portion (321) of the insulator layer on the rear face, c) applying an electrical voltage to said accessible area (210), in order to make said electrical connection contact.</p>
申请公布号 WO2010081852(A1) 申请公布日期 2010.07.22
申请号 WO2010EP50408 申请日期 2010.01.14
申请人 S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES;LAGAHE BLANCHARD, CHRYSTELLE 发明人 LAGAHE BLANCHARD, CHRYSTELLE
分类号 H01L21/66 主分类号 H01L21/66
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