发明名称
摘要 PROBLEM TO BE SOLVED: To provide a method for nitriding a workpiece, by which a nitride film (insulating layer) of good characteristics can be formed in a state to highly hold the controllability of a film thickness. SOLUTION: In the nitriding method for nitriding the surface of the workpiece W that is made at a prescribed temperature in a treating vessel 2, the nitriding is performed by using H2 and NH3 under a reduced pressure atmosphere to form nitride films 76, 82. As a result, the nitride film (insulating layer) of good characteristics is formed in a state to highly hold the controllability of the film thickness.
申请公布号 JP4506056(B2) 申请公布日期 2010.07.21
申请号 JP20010264832 申请日期 2001.08.31
申请人 发明人
分类号 H01L21/318 主分类号 H01L21/318
代理机构 代理人
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