| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photoresist composition having a high curing speed and excellent etching resistance even without needing post baking. <P>SOLUTION: This photoresist composition contains, as essential components, at least one kind of polymerizable compound (A) having at least two propenyl ether terminal groups, selected from a group of a monomer (A1), a polyether oligomer (A2) and a polyester oligomer (A3) each having a propenyl ether terminal group; and a photo-acid-generating agent (B). In the photoresist composition, a hydroxyl value of the polymerizable compound (A) is 0-10 mgKOH/g. The photoresist composition does not need the post baking. <P>COPYRIGHT: (C)2010,JPO&INPIT |
