发明名称 LIQUID IMMERSION EXPOSURE APPARATUS AND LIQUID IMMERSION EXPOSURE METHOD
摘要 <P>PROBLEM TO BE SOLVED: To prevent the outer peripheral edge of an organic film from peeling from a substrate when an immersion liquid is moved from the outer peripheral stage to the exposure stage of a liquid immersion exposure apparatus. <P>SOLUTION: The immersion exposure apparatus 100 includes the exposure stage 10, the outer peripheral stage 20, a projection lens 30, and a driving unit 40. The driving unit 40 drives the outer peripheral stage 20 arranged at the periphery of the exposure stage 10 in an elevating/lowering direction relatively to a substrate 52 having the organic film 50 provided on its upper surface. Then the outer peripheral stage 20 is relatively driven by the driving unit 40 in a non-contact manner with the substrate 52, and in a part or the whole of a proximity edge 24 of the upper surface 22 of the outer peripheral stage 20 nearby the organic film 50, its lower-limit position driven by the driving unit 40 is in level with or below the organic film 50 and also its upper-limit position H is above the organic film 50. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010153661(A) 申请公布日期 2010.07.08
申请号 JP20080331501 申请日期 2008.12.25
申请人 RENESAS ELECTRONICS CORP 发明人 KODAMA TERUHIKO
分类号 H01L21/027;G03F7/20;H01L21/68 主分类号 H01L21/027
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