发明名称 MULTI-ELECTRODE PECVD SOURCE
摘要 Embodiments of the present invention generally relate to methods and apparatus for plasma generation in plasma processes. The methods and apparatus generally include a plurality of electrodes. The electrodes are connected to a RF power source, which powers the electrodes out of phase from one another. Adjacent electrodes are electrically isolated from one another by electrically insulating members disposed between and coupled to the electrodes. Processing gas may be delivered and/or withdrawn through the electrodes and/or the electrically insulating members. The substrate may remain electrically floating because the plasma may be capacitively coupled to it through a differential RF source drive.
申请公布号 WO2010039883(A3) 申请公布日期 2010.07.08
申请号 WO2009US59101 申请日期 2009.09.30
申请人 APPLIED MATERIALS, INC.;KUDELA, JOZEF;WHITE, JOHN M. 发明人 KUDELA, JOZEF;WHITE, JOHN M.
分类号 H01L21/205 主分类号 H01L21/205
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