发明名称 MONOMER COMPOUND COMPRISING A PHENYLTHIO GROUP, SYNTHETIC METHOD THEREOF, AND ANTIREFLECTION FILM COMPRISING THE SAME
摘要 PURPOSE: A monomer compound including a phenlthio group is provided to obtain excellent optical absorbance power about a shortwave light source having a wavelength less than 193 nm excimer laser and to be used for manufacturing a linear polymer by including an acrylate group. CONSTITUTION: A monomer compound is marked as a chemical formula 1. In the chemical formula 1, R1 is hydrogen or a methyl group and n is integer of 0-5. In the chemical formula 1, R2 and R3 are an alkyl group of C1-C5 or an alkoxy group of C1-C5. A method for manufacturing the monomer compound including a step of reacting a compound of a chemical formula 2 with a compound of a chemical formula 3 or a chemical formula 4 under the presence of base.
申请公布号 KR20100077453(A) 申请公布日期 2010.07.08
申请号 KR20080135385 申请日期 2008.12.29
申请人 HYOSUNG CORPORATION 发明人 KIM, HYUNG JUN;CHO, IN SIK;SOH, BYOUNG WHAN
分类号 C07C321/18 主分类号 C07C321/18
代理机构 代理人
主权项
地址