发明名称 |
MONOMER COMPOUND COMPRISING A PHENYLTHIO GROUP, SYNTHETIC METHOD THEREOF, AND ANTIREFLECTION FILM COMPRISING THE SAME |
摘要 |
PURPOSE: A monomer compound including a phenlthio group is provided to obtain excellent optical absorbance power about a shortwave light source having a wavelength less than 193 nm excimer laser and to be used for manufacturing a linear polymer by including an acrylate group. CONSTITUTION: A monomer compound is marked as a chemical formula 1. In the chemical formula 1, R1 is hydrogen or a methyl group and n is integer of 0-5. In the chemical formula 1, R2 and R3 are an alkyl group of C1-C5 or an alkoxy group of C1-C5. A method for manufacturing the monomer compound including a step of reacting a compound of a chemical formula 2 with a compound of a chemical formula 3 or a chemical formula 4 under the presence of base.
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申请公布号 |
KR20100077453(A) |
申请公布日期 |
2010.07.08 |
申请号 |
KR20080135385 |
申请日期 |
2008.12.29 |
申请人 |
HYOSUNG CORPORATION |
发明人 |
KIM, HYUNG JUN;CHO, IN SIK;SOH, BYOUNG WHAN |
分类号 |
C07C321/18 |
主分类号 |
C07C321/18 |
代理机构 |
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