PURPOSE: A stamp manufacturing method for nanoimprint is provided to form a minute pattern of a nano structure on a stamp since the stamp is manufactured by a nanoimprint process by using a master board on which a pattern of a nano structure is formed. CONSTITUTION: A pattern is formed on one side of a master board. An etch barrier layer(132) is evaporated on one side of a stamp substrate(130). Photoresist is applied onto one surface of either one side of the master board or the etch barrier layer. A photoresist pattern(142) formed out of the photoresist is formed on the stamp substrate. A hard mask is formed by etching the etch barrier layer.
