发明名称 SUBSTRATE PROCESSING APPARATUS, DISPLAYING METHOD THEREOF, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To simultaneously display the mounting states of substrates held in a substrate holding tool and the detailed informations of the mounting states, on a same screen. SOLUTION: The substrate processing apparatus carries a substrate holding tool having a plurality of mounted substrates, into a furnace and perform predetermined processing. The mounting states of the respective substrates, the crack-detecting-result informations of the respective substrates, and the recovering states of the substrates which are determined as abnormal ones by crack-detecting-result informations are displayed on an operating screen. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010153906(A) 申请公布日期 2010.07.08
申请号 JP20100051050 申请日期 2010.03.08
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 YONEDA AKIHIKO;FUJIMOTO KENICHI
分类号 H01L21/02;H01L21/22;H01L21/31;H01L21/683 主分类号 H01L21/02
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