发明名称 Device for the generation of a gas curtain for plasma-based EUV radiation sources
摘要 The invention is directed to a device for generating flows of gas for filtering the radiation emitted in plasma-based radiation sources. It is the object of the invention to find a novel possibility for generating a gas curtain in the immediate vicinity of a radiating plasma so as to permit a simple arrangement and design and a long life of the device for generating the gas curtain under extreme thermal stress. According to the invention, this object is met in that a slit nozzle is formed of a plurality of partial bodies comprising different materials to form a supersonic nozzle profile for the generation of a broad gas curtain in order to accommodate the slit nozzle to different thermal and precision-mechanical requirements in the gas inlet region and in the gas outlet region.
申请公布号 US7750327(B2) 申请公布日期 2010.07.06
申请号 US20080120536 申请日期 2008.05.14
申请人 XTREME TECHNOLOGIES GMBH 发明人 TRAN CHINH DUC;BRUDERMANN JESKO;MADER BJOERN;DORNIEDEN GILBERT;BRAUNER THOMAS
分类号 H04H0001/000004 主分类号 H04H0001/000004
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